Intellectual Property Office
Non-Confidential Disclosures
“Patterning of Dielectric Compositions using Electron-Beam Lithography”
PSU Inv. Disc. No 2419
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Field of the Invention/Keywords:
Nanotechnology, Lithography, Electron Beam, Bizbenzocyclobutene (BCB)
Inventors:
Guy Lavallee, Jeffrey Catchmark
Links:
US Patent 6,919,164
Inventor Website
Background:
Size scales for optical, optoelectronic, and electronic structures and devices continue to shrink to dimensions well less than 100 nanometers (nm). The integration and interconnection of these devices demands substrate patterning at even smaller size scales. A variety of technologies are being investigated as a means to develop reliable methods of nanolithography. Electron beam nanolithography is one method that continues to be the topic of ongoing investigation due to its ability to achieve very high resolution.
Invention description:
The disclosed invention describes a method for nanolithography based on electron beam patterning of features less than 50 nm into photosensitive, polymeric, dielectric resins, such as bizbenzocyclobutene. The invention also describes how a variety of nanoscale devices can be manufactured using this method, as well as applications of such features. Examples include nanoscale electrical interconnects for integrated circuits, and noble metal nanostructures for plasmonic devices.
Advantages:
- Fabrication by electron beam lithography
- Features of lengths less than 50 nm and roughly 10:1 aspect ratios have been demonstrated
- Commercially available bizbenzocyclobutene has excellent characteristics for the manufacture of nanoscale devices
- Applicable to a variety of substrates and compositions that are sensitive to electron beam lithography
Contact:
Richard M. Weyer
Sr. Technology Licensing Officer
Intellectual Property Office
113 Technology Center
The Pennsylvania State Univ.
University Park, PA 16802-7000
Phone: (814) 865-6279
Fax: (814) 865-3591
E-mail:rmw4@psu.edu |
